
Electro-Nano-Pulsing (ENP) Advance 4X Platform
Nanosecond pulsed-current processing for grain-boundary engineering.
The Xu group develops customized electro-nano-pulsing platforms for grain-boundary engineering in metallic materials. The ENP Advance 4X system applies programmable nanosecond-scale current pulses to small metallic specimens to probe localized electrical, thermal, and electron-wind effects at grain boundaries.
- Ultra-intense nanosecond pulsed-current processing
- Four-pair copper feed-plate architecture on alumina-ceramic PCB
- Removable central chamber for inert Ar or liquid-nitrogen operation
- Designed for small metallic strip specimens
- Supports studies separating Joule-heating and electron-wind effects


